Browsing by Author Weisemoeller, T.

Showing results 1 to 12 of 12
Issue DateTitleAuthor(s)
2009Effect of amorphous interface layers on crystalline thin-film x-ray diffractionWeisemoeller, T.; Bertram, F. ; Gevers, S.; Deiter, C.; Greuling, A.; Wollschlaeger, J.
2009Epitaxial growth of Bi(111) on Si(001)Jnawali, G.; Hattab, H.; Bobisch, C.A.; Bernhart, A.; Zubkov, E.; Deiter, C.; Weisemoeller, T.; Bertram, F. ; Wollschl̈ager, J. ; M̈oller, R.; Hoegen, M.H.-V.
2008Epitaxy of single crystalline PrO2 films on Si(111)Weisemoeller, T.; Deiter, C.; Bertram, F. ; Gevers, S.; Giussani, A.; Zaumseil, P.; Schroeder, T.; Wollschlaeger, J.
2009Erratum: Epitaxial growth of Bi(111) on Si(001) (e-Journal of Surface Science and Nanotechnology (2009) 7 (441-447))Jnawali, G.; Hattab, H.; Bobisch, C.A.; Bernhart, A.; Krenzer, B.; Zubkov, E.; Deiter, C.; Weisemoeller, T.; Bertram, F. ; Wollschläger, J. ; Möller, R.; Horn-Von Hoegen, M.
2010Improved epitaxy of ultrathin praseodymia films on chlorine passivated Si(111) reducing silicate interface formationGevers, S.; Flege, J. I.; Kaemena, B.; Bruns, D.; Weisemoeller, T.; Falta, J.; Wollschlaeger, J.
2011Post-deposition annealing of praseodymia films on Si(111) at low temperaturesGevers, S.; Weisemoeller, T.; Bruns, D.; Giussani, A.; Schroeder, T.; Wollschlaeger, J.
2009Postdeposition annealing induced transition from hexagonal Pr2O3 to cubic PrO2 films on Si(111)Weisemoeller, T.; Bertram, F. ; Gevers, S.; Greuling, A.; Deiter, C.; Tobergte, H.; Neumann, M.; Wollschlaeger, J.; Giussani, A.; Schroeder, T.
2009Structural phase transition of ultra thin PrO2 films on Si(111)Gevers, S.; Weisemoeller, T.; Zimmermann, B.; Bertram, F. ; Deiter, C.; Wollschlaeger, J.
2010Structure and stability of cub-Pr2O3 films on Si(111) under post deposition annealing conditionsGevers, S.; Weisemoeller, T.; Zimmermann, B.; Deiter, C.; Wollschläger, J. 
2011Structure of oxygen-plasma-treated ultrathin praseodymia films on Si(111)Gevers, S.; Weisemoeller, T.; Schaefer, A.; Zielasek, V.; Baeumer, M.; Wollschlaeger, J.
2008The influence of lattice oxygen on the initial growth behavior of heteroepitaxial Ge layers on single crystalline PrO2(111)/Si(111) support systemsGiussani, A.; Seifarth, O.; Rodenbach, P.; Muessig, H.-J.; Zaumseil, P.; Weisemoeller, T.; Deiter, C.; Wollschlaeger, J.; Storck, P.; Schroeder, T.
2007Tuning ability of photosensitive ML5NO-moleculesImlau, M. ; Dieckmann, V.; Weisemoeller, T.; Schaniel, D.; Woike, T.; Krämer, K.W.; Güdel, H.-U.