Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)

Autor(en): Kuschel, Olga 
Dieck, Florian
Wilkens, Henrik 
Gevers, Sebastian
Rodewald, Jari 
Otte, Christian
Zoellner, Marvin Hartwig
Niu, Gang
Schroeder, Thomas
Wollschlaeger, Joachim 
Stichwörter: Chemistry; Chemistry, Physical; GROWTH; low energy electron diffraction; Materials Science; Materials Science, Multidisciplinary; Metallurgy & Metallurgical Engineering; molecular beam epitaxy; phase separation; Physics; Physics, Applied; Physics, Condensed Matter; plasma enhanced oxidation; PR2O3; praseodymia; REFLECTION; STRAIN; SURFACE; synchrotron radiation X-ray diffraction; synchrotron radiation X-ray reflectometry; ultrathin film; X-ray photoelectron spectroscopy
Erscheinungsdatum: 2015
Herausgeber: MDPI
Journal: MATERIALS
Volumen: 8
Ausgabe: 9
Startseite: 6379
Seitenende: 6390
Zusammenfassung: 
Praseodymia films have been exposed to oxygen plasma at room temperature after deposition on Si(111) via molecular beam epitaxy. Different parameters as film thickness, exposure time and flux during plasma treatment have been varied to study their influence on the oxygen plasma oxidation process. The surface near regions have been investigated by means of X-ray photoelectron spectroscopy showing that the plasma treatment transforms the stoichiometry of the films from Pr 2 O 3 to PrO 2 . Closer inspection of the bulk properties of the films by means of synchrotron radiation based X-ray reflectometry and diffraction confirms this transformation if the films are thicker than some critical thickness of 6 nm. The layer distance of these films is extremely small verifying the completeness of the plasma oxidation process. Thinner films, however, cannot be transformed completely. For all films, less oxidized very thin interlayers are detected by these experimental techniques.
DOI: 10.3390/ma8095312

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