Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)
| Autor(en): | Kuschel, Olga Dieck, Florian Wilkens, Henrik Gevers, Sebastian Rodewald, Jari Otte, Christian Zoellner, Marvin Hartwig Niu, Gang Schroeder, Thomas Wollschlaeger, Joachim |
Stichwörter: | Chemistry; Chemistry, Physical; GROWTH; low energy electron diffraction; Materials Science; Materials Science, Multidisciplinary; Metallurgy & Metallurgical Engineering; molecular beam epitaxy; phase separation; Physics; Physics, Applied; Physics, Condensed Matter; plasma enhanced oxidation; PR2O3; praseodymia; REFLECTION; STRAIN; SURFACE; synchrotron radiation X-ray diffraction; synchrotron radiation X-ray reflectometry; ultrathin film; X-ray photoelectron spectroscopy | Erscheinungsdatum: | 2015 | Herausgeber: | MDPI | Journal: | MATERIALS | Volumen: | 8 | Ausgabe: | 9 | Startseite: | 6379 | Seitenende: | 6390 | Zusammenfassung: | Praseodymia films have been exposed to oxygen plasma at room temperature after deposition on Si(111) via molecular beam epitaxy. Different parameters as film thickness, exposure time and flux during plasma treatment have been varied to study their influence on the oxygen plasma oxidation process. The surface near regions have been investigated by means of X-ray photoelectron spectroscopy showing that the plasma treatment transforms the stoichiometry of the films from Pr 2 O 3 to PrO 2 . Closer inspection of the bulk properties of the films by means of synchrotron radiation based X-ray reflectometry and diffraction confirms this transformation if the films are thicker than some critical thickness of 6 nm. The layer distance of these films is extremely small verifying the completeness of the plasma oxidation process. Thinner films, however, cannot be transformed completely. For all films, less oxidized very thin interlayers are detected by these experimental techniques. |
DOI: | 10.3390/ma8095312 |
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