Reordering between tetrahedral and octahedral sites in ultrathin magnetite films grown on MgO(001)

DC FieldValueLanguage
dc.contributor.authorBertram, F.
dc.contributor.authorDeiter, C.
dc.contributor.authorSchemme, T.
dc.contributor.authorJentsch, S.
dc.contributor.authorWollschlaeger, J.
dc.date.accessioned2021-12-23T16:12:24Z-
dc.date.available2021-12-23T16:12:24Z-
dc.date.issued2013
dc.identifier.issn00218979
dc.identifier.urihttps://osnascholar.ub.uni-osnabrueck.de/handle/unios/10192-
dc.description.abstractMagnetite ultrathin films were grown using different deposition rates and substrate temperatures. The structure of these films was studied using (grazing incidence) x-ray diffraction, while their surface structure was characterized by low energy electron diffraction. In addition to that, we performed x-ray photoelectron spectroscopy and magneto optic Kerr effect measurements to probe the stoichiometry of the films as well as their magnetic properties. The diffraction peaks of the inverse spinel structure, which originate exclusively from Fe ions on tetrahedral sites are strongly affected by the preparation conditions, while the octahedral sites remain almost unchanged. With both decreasing deposition rate as well as decreasing substrate temperature, the integrated intensity of the diffraction peaks originating exclusively from Fe on tetrahedral sites is decreasing. We propose that the ions usually occupying tetrahedral sites in magnetite are relocated to octahedral vacancies. Ferrimagnetic behaviour is only observed for well ordered magnetite films. (C) 2013 AIP Publishing LLC.
dc.language.isoen
dc.publisherAMER INST PHYSICS
dc.relation.ispartofJOURNAL OF APPLIED PHYSICS
dc.subjectAG(111)
dc.subjectFE3O4 FILMS
dc.subjectIRON-OXIDE FILMS
dc.subjectMOLECULAR-BEAM EPITAXY
dc.subjectPhysics
dc.subjectPhysics, Applied
dc.subjectSPINTRONICS
dc.subjectSURFACE-STRUCTURE
dc.subjectTHIN-FILMS
dc.titleReordering between tetrahedral and octahedral sites in ultrathin magnetite films grown on MgO(001)
dc.typejournal article
dc.identifier.doi10.1063/1.4803894
dc.identifier.isiISI:000319294100066
dc.description.volume113
dc.description.issue18
dc.contributor.orcid0000-0001-9002-4118
dc.publisher.placeCIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA
dcterms.isPartOf.abbreviationJ. Appl. Phys.
crisitem.author.deptUniversität Osnabrück-
crisitem.author.deptFB 04 - Physik-
crisitem.author.deptidfb04-
crisitem.author.orcid0000-0001-9002-4118-
crisitem.author.parentorgUniversität Osnabrück-
crisitem.author.netidBeFl001-
crisitem.author.netidScTo645-
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