Effects of Post-deposition Annealing on Epitaxial CoO/Fe3O4 Bilayers on SrTiO3(001) and Formation of Thin High-Quality Cobalt Ferrite-like Films
Autor(en): | Thien, Jannis Bahlmann, Jascha Alexander, Andreas Hoppe, Martin Pohlmann, Tobias Ruwisch, Kevin Meyer, Carola Bertram, Florian Kuepper, Karsten Wollschlaeger, Joachim |
Stichwörter: | BEAMLINE; Chemistry; Chemistry, Physical; COFE2O4; IRON-OXIDE FILMS; Materials Science; Materials Science, Multidisciplinary; NANOPARTICLES; Nanoscience & Nanotechnology; OXIDATION; OXYGEN REDUCTION; PHOTOEMISSION; Science & Technology - Other Topics; SPECTRA; SPECTROSCOPY; X-RAY PHOTOELECTRON | Erscheinungsdatum: | 2020 | Herausgeber: | AMER CHEMICAL SOC | Journal: | JOURNAL OF PHYSICAL CHEMISTRY C | Volumen: | 124 | Ausgabe: | 43 | Startseite: | 23895 | Seitenende: | 23904 | Zusammenfassung: | In order to explore an alternative pathway to prepare ultrathin CoFe2O4 films, epitaxial CoO/Fe3O4 bilayers with varying film thickness of the CoO film were grown on Nb-doped SrTiO3(001) substrates via reactive molecular beam epitaxy. Thereafter, cobalt ferrite films with varying stoichiometry were prepared by post-deposition annealing at different temperatures. The thermally mediated interdiffusion resulted in the formation of vertical compressive and lateral tensile strained CoxFe3-xO4 films (x = 0.6 - 1.4) with homogeneous distribution of Fe and Co cations for each film. The chemical and electronic variations after each annealing step were studied by means of soft and hard X-ray photoelectron spectroscopy. The homogeneity of the cation distributions in the films were additionally verified after the last annealing step by angle-resolved hard X-ray photoelectron spectroscopy. For the cobalt ferrite film with x = 1.4, an additional crystallographic phase of Co1-yFeyO was observed by (grazing incidence) X-ray diffraction measurements after annealing at 600 degrees C. X-ray reflectivity measurements were performed to determine the film thickness of the formed CoxFe3-xO4 films. |
ISSN: | 19327447 | DOI: | 10.1021/acs.jpcc.0c05503 |
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geprüft am 14.05.2024