Structure of oxygen-plasma-treated ultrathin praseodymia films on Si(111)

DC FieldValueLanguage
dc.contributor.authorGevers, S.
dc.contributor.authorWeisemoeller, T.
dc.contributor.authorSchaefer, A.
dc.contributor.authorZielasek, V.
dc.contributor.authorBaeumer, M.
dc.contributor.authorWollschlaeger, J.
dc.date.accessioned2021-12-23T16:13:54Z-
dc.date.available2021-12-23T16:13:54Z-
dc.date.issued2011
dc.identifier.issn10980121
dc.identifier.urihttps://osnascholar.ub.uni-osnabrueck.de/handle/unios/10807-
dc.description.abstractUltrathin praseodymia films, which have been oxidized by molecular oxygen, have been treated additionally with oxygen plasma to increase their oxidation state. The structure and morphology of the films have been investigated by x-ray diffraction and x-ray reflectometry. Thorough analysis of these measurements gives information regarding modifications of the oxide film structure (especially the vertical lattice constants) due to the oxygen content and interface silicate formation before and after oxygen plasma treatment. Large parts of the plasma-treated samples exhibit a significantly higher oxygen content compared to the untreated samples; this is attributed to the formation of stoichiometric PrO(2). The remaining film has only a small oxygen deficiency. Thus, a more homogeneous film structure is formed by exposure to oxygen plasma. Furthermore, no additional silicate interface formation can be detected.
dc.description.sponsorshipDeutsche Forschungsgemeinschaft (DFG) via Graduate CollegeGerman Research Foundation (DFG) [695]; [WO533/16]; The authors acknowledge the Deutsche Forschungsgemeinschaft (DFG) via Graduate College 695 and Grant No. WO533/16 for financial support. Furthermore, D. Novikov is acknowledged for beamline support for synchrotron experiments carried out at HASYLAB/DESY. DESY is a member of the Helmholtz Association (HGF). The samples were kindly provided by T. Schroeder and A. Guissani at the IHP GmbH, Frankfurt (Oder).
dc.language.isoen
dc.publisherAMER PHYSICAL SOC
dc.relation.ispartofPHYSICAL REVIEW B
dc.subjectMaterials Science
dc.subjectMaterials Science, Multidisciplinary
dc.subjectPhysics
dc.subjectPhysics, Applied
dc.subjectPhysics, Condensed Matter
dc.subjectPR2O3
dc.subjectSTRAIN
dc.titleStructure of oxygen-plasma-treated ultrathin praseodymia films on Si(111)
dc.typejournal article
dc.identifier.doi10.1103/PhysRevB.83.193408
dc.identifier.isiISI:000290943200001
dc.description.volume83
dc.description.issue19
dc.contributor.orcid0000-0001-6578-5046
dc.contributor.orcid0000-0002-8620-1764
dc.contributor.orcid0000-0002-8620-1764
dc.contributor.researcheridD-4919-2012
dc.contributor.researcheridAAC-2802-2019
dc.contributor.researcheridS-5441-2016
dc.publisher.placeONE PHYSICS ELLIPSE, COLLEGE PK, MD 20740-3844 USA
dcterms.isPartOf.abbreviationPhys. Rev. B
dcterms.oaStatusGreen Published
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