Structure of oxygen-plasma-treated ultrathin praseodymia films on Si(111)

Autor(en): Gevers, S.
Weisemoeller, T.
Schaefer, A.
Zielasek, V.
Baeumer, M.
Wollschlaeger, J.
Stichwörter: Materials Science; Materials Science, Multidisciplinary; Physics; Physics, Applied; Physics, Condensed Matter; PR2O3; STRAIN
Erscheinungsdatum: 2011
Herausgeber: AMER PHYSICAL SOC
Enthalten in: PHYSICAL REVIEW B
Band: 83
Ausgabe: 19
Zusammenfassung: 
Ultrathin praseodymia films, which have been oxidized by molecular oxygen, have been treated additionally with oxygen plasma to increase their oxidation state. The structure and morphology of the films have been investigated by x-ray diffraction and x-ray reflectometry. Thorough analysis of these measurements gives information regarding modifications of the oxide film structure (especially the vertical lattice constants) due to the oxygen content and interface silicate formation before and after oxygen plasma treatment. Large parts of the plasma-treated samples exhibit a significantly higher oxygen content compared to the untreated samples; this is attributed to the formation of stoichiometric PrO(2). The remaining film has only a small oxygen deficiency. Thus, a more homogeneous film structure is formed by exposure to oxygen plasma. Furthermore, no additional silicate interface formation can be detected.
ISSN: 10980121
DOI: 10.1103/PhysRevB.83.193408

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