XPS characterisation of neodymium gallate wafers

DC ElementWertSprache
dc.contributor.authorTalik, E
dc.contributor.authorKruczek, A
dc.contributor.authorSakowska, H
dc.contributor.authorUjma, Z
dc.contributor.authorGala, M
dc.contributor.authorNeumann, M
dc.date.accessioned2021-12-23T16:16:33Z-
dc.date.available2021-12-23T16:16:33Z-
dc.date.issued2004
dc.identifier.issn09258388
dc.identifier.urihttps://osnascholar.ub.uni-osnabrueck.de/handle/unios/11926-
dc.description.abstractXPS examinations of NdGaO3 single crystals were performed. A change of the chemical composition was found in wafers cut from the beginning, middle and end part of a crystal crown along the [011] direction. The existence of core level satellites at low binding energy related to defects was revealed. Unpolished, polished and substrates etched with H3PO4 show a decrease of gallium concentration in relation to a broken surface and to the nominal composition. Annealing of the substrates at different temperatures causes a decomposition due to escape of gallium not only from the surface but from inner parts as well. A comparison of the wafers from the crystals grown along different crystallographic direction reveals changes of the chemical composition and a variable level of defects. This was confirmed by etch pitch density measurements. The above measurements demonstrate the high sensitivity of gallium on processing. (C) 2004 Elsevier B.V. All rights reserved.
dc.language.isoen
dc.publisherELSEVIER SCIENCE SA
dc.relation.ispartofJOURNAL OF ALLOYS AND COMPOUNDS
dc.subjectChemistry
dc.subjectChemistry, Physical
dc.subjectCRYSTALS
dc.subjectelectronic state
dc.subjectGAN
dc.subjectGROWTH
dc.subjectMaterials Science
dc.subjectMaterials Science, Multidisciplinary
dc.subjectMetallurgy & Metallurgical Engineering
dc.subjectphotoelectron spectroscopy
dc.subjectsingle crystal
dc.subjectSUBSTRATE
dc.titleXPS characterisation of neodymium gallate wafers
dc.typejournal article
dc.identifier.doi10.1016/j.jallcom.2004.01.037
dc.identifier.isiISI:000223801000048
dc.description.volume377
dc.description.issue1-2
dc.description.startpage259
dc.description.endpage267
dc.contributor.orcid0000-0002-4994-055X
dc.contributor.researcheridC-3515-2018
dc.identifier.eissn18734669
dc.publisher.placePO BOX 564, 1001 LAUSANNE, SWITZERLAND
dcterms.isPartOf.abbreviationJ. Alloy. Compd.
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