Stabilization of the ceria i-phase (Ce7O12) surface on Si(111)
Autor(en): | Wilkens, H. Schuckmann, O. Oelke, R. Gevers, S. Schaefer, A. Baeumer, M. Zoellner, M. H. Schroeder, T. Wollschlaeger, J. |
Stichwörter: | CEO2; EPITAXIAL-GROWTH; FILMS; Physics; Physics, Applied; REDUCTION; SYSTEM | Erscheinungsdatum: | 2013 | Herausgeber: | AMER INST PHYSICS | Journal: | APPLIED PHYSICS LETTERS | Volumen: | 102 | Ausgabe: | 11 | Zusammenfassung: | In this work a 250 nm CeO2(111) film grown on a hex-Pr2O3(0001)/Si(111) system is annealed at 660 degrees C for 30 min to form the i bulk phase of Ce7O12 as controlled by x-ray photoelectron spectroscopy. The (111) surface of the stabilized i phase is characterized via high-resolution low-energy electron diffraction. The i-phase surface exhibits a (root 7 x root 7)R19.1 degrees superstructure with two mirror domains. This structure is attributed to a periodic ordering of oxygen vacancies compared to the fluorite structure of CeO2. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4795867] |
ISSN: | 00036951 | DOI: | 10.1063/1.4795867 |
Zur Langanzeige
Seitenaufrufe
1
Letzte Woche
0
0
Letzter Monat
0
0
geprüft am 19.05.2024