Arsenic contamination of coarse-grained and nanostructured nitinol surfaces induced by chemical treatment in hydrofluoric acid

Autor(en): Korotin, D. M.
Bartkowski, S.
Kurmaev, E. Z.
Borchers, C.
Mueller, M.
Neumann, M.
Gunderov, D. V.
Valiev, R. Z.
Cholakh, S. O.
Stichwörter: arsenic contamination; Engineering; Engineering, Biomedical; Materials Science; Materials Science, Biomaterials; nitinol; TiO2; XPS
Erscheinungsdatum: 2012
Herausgeber: WILEY
Journal: JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART B-APPLIED BIOMATERIALS
Volumen: 100B
Ausgabe: 7
Startseite: 1812
Seitenende: 1816
Zusammenfassung: 
XPS measurements of coarse-grained and nanostructured nitinol (Ni50.2Ti49.8) before and after chemical treatment in hydrofluoric acid (40% HF, 1 min) are presented. The nanostructured state, providing the excellent mechanical properties of nitinol, is achieved by severe plastic deformation. The near-surface layers of nitinol were studied by XPS depth profiling. According to the obtained results, a chemical treatment in hydrofluoric acid reduces the thickness of the protective TiO2 oxide layer and induces a nickel release from the nitinol surface and an arsenic contamination, and can therefore not be recommended as conditioning to increase the roughness of NiTi-implants. A detailed evaluation of the resulting toxicological risks is given. (C) 2012 Wiley Periodicals, Inc. J Biomed Mater Res Part B: Appl Biomater, 2012.
ISSN: 15524973
DOI: 10.1002/jbm.b.32748

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