UV-assisted activation of LiB3O5-surfaces studied by low-coherence microscopy & XPS
| Autor(en): | Andresen, Ä. Möller, S. Imlau, M. |
Stichwörter: | Chemical activation; Light refraction; Light sensitive materials; Photorefractive materials; Photosensitivity; Silica; Ultraviolet lasers; X ray photoelectron spectroscopy, Layer growth; Low-coherence; Q-switched; Sum frequency mixing; Ultraviolet laser light, Photoreactivity | Erscheinungsdatum: | 2007 | Herausgeber: | Optical Society of America (OSA) | Journal: | Optics InfoBase Conference Papers | Zusammenfassung: | We report on the possibility to activate LiB3O5-surfaces by exposure to Q-switched ultraviolet laser light via sum-frequency mixing. Investigations with low-coherence microscopy and XPS reveal that the activation initiates parasitic SiO2 layer-growth. © 2007 Optical Society of America. |
Beschreibung: | Conference of Photorefractive Effects, Photosensitivity, Fiber Gratings, Photonic Materials and More, PR 2007 ; Conference Date: 14 October 2007 Through 14 October 2007; Conference Code:104736 |
ISBN: | 9781557528483 | ISSN: | 21622701 | DOI: | 10.1364/pr.2007.mb7 | Externe URL: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85087595216&doi=10.1364%2fpr.2007.mb7&partnerID=40&md5=9f00bfe5e4889c5dd092850bc7d017a3 |
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