SPUTTERING AND CRATER FORMATION IN OXIDIC MATERIALS DUE TO ION-INDUCED SPUTTERING DEPENDENT ON ENERGY

Autor(en): PRIGGEMEYER, S
HEILAND, W
Stichwörter: Instruments & Instrumentation; Nuclear Science & Technology; PB; Physics; Physics, Atomic, Molecular & Chemical; Physics, Nuclear
Erscheinungsdatum: 1993
Herausgeber: ELSEVIER SCIENCE BV
Journal: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Volumen: 78
Ausgabe: 1-4
Startseite: 198
Seitenende: 203
Zusammenfassung: 
The etch rate of material due to ion bombardment is the amount of material removed per unit time at a given set of beam parameters. Usually the etch rate is given in units of length/time. The length is measured as the depth of the craters formed by the ion beam. With insulating materials we obtain a dependence of the etch rate on charging effects. Also the crater formation is influenced by charging, i.e. `'walls'' are found to build around the craters. We studied these effects dependent on energy in different oxidic materials, i.e. yttrium-iron garnets (YIG) and gadolinium-gallium garnets (GGG).
Beschreibung: 
6TH INTERNATIONAL WORKSHOP ON INELASTIC ION-SURFACE COLLISIONS ( IISC-9 ), AUSSOIS, FRANCE, SEP 14-18, 1992
ISSN: 0168583X
DOI: 10.1016/0168-583X(93)95799-B

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