Morphological and chemical characterization of thin heteroepitaxial praseodymium sesquioxide films on Si(111)

DC FieldValueLanguage
dc.contributor.authorSchaefer, Andreas T.
dc.contributor.authorZielasek, Volkmar
dc.contributor.authorBaeumer, Marcus
dc.contributor.authorSchmidt, Thomas J.
dc.contributor.authorFalta, Jens
dc.contributor.authorSandell, Anders
dc.contributor.authorWollschlaeger, Joachim
dc.date.accessioned2023-02-22T08:19:38Z-
dc.date.available2023-02-22T08:19:38Z-
dc.date.issued2008
dc.identifier.urihttp://osnascholar.ub.uni-osnabrueck.de/handle/unios/69241-
dc.relation.ispartofVerhandlungen der Deutschen Physikalischen Gesellschaft
dc.subjectSesquioxide
dc.subjectChemistry
dc.subjectMineralogy
dc.subjectMaterials science
dc.subjectMetallurgy
dc.subjectCharacterization (materials science)
dc.subjectNanotechnology
dc.subjectPraseodymium
dc.subjectThin film
dc.titleMorphological and chemical characterization of thin heteroepitaxial praseodymium sesquioxide films on Si(111)
dc.typetext
dc.identifier.urlhttps://inis.iaea.org/search/search.aspx?orig_q=RN:40070596
dc.description.volume43
dc.description.issue1
dc.contributor.orcidhttps://orcid.org/0000-0001-7304-6083
dc.contributor.orcidhttps://orcid.org/0000-0003-4102-0617
dc.contributor.orcidhttps://orcid.org/0000-0002-1636-367X
dc.contributor.orcidhttps://orcid.org/0000-0002-4154-822X
dc.contributor.orcidhttps://orcid.org/0000-0002-6120-7502
dc.identifier.externalhttps://openalex.org/W3186830506
local.import.sourcefileopenalex_20230217.ris
local.rawaffiliationSchaefer, Andreas T.~https://orcid.org/0000-0001-7304-6083;Zielasek, Volkmar~https://orcid.org/0000-0003-4102-0617;Baeumer, Marcus~;Schmidt, Thomas J.~https://orcid.org/0000-0002-1636-367X;Falta, Jens~https://orcid.org/0000-0002-4154-822X;Sandell, Anders~https://orcid.org/0000-0002-6120-7502;Wollschlaeger, Joachim~
crisitem.author.deptFB 04 - Physik-
crisitem.author.deptidfb04-
crisitem.author.orcid0000-0002-3043-3718-
crisitem.author.parentorgUniversität Osnabrück-
crisitem.author.netidWoJo788-
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