Effect of amorphous interface layers on crystalline thin-film x-ray diffraction

Autor(en): Weisemoeller, T.
Bertram, F. 
Gevers, S.
Deiter, C.
Greuling, A.
Wollschlaeger, J.
Stichwörter: amorphous state; interface structure; Materials Science; Materials Science, Multidisciplinary; multilayers; Physics; Physics, Applied; Physics, Condensed Matter; praseodymium compounds; silicon; thin films; X-ray diffraction; X-ray reflection
Erscheinungsdatum: 2009
Volumen: 79
Ausgabe: 24
In this work, an analysis method of x-ray diffraction data of crystalline structures with amorphous interface layers is presented and applied to single crystalline films on amorphous interface layers. Thickness and morphology of crystalline films are obtained from x-ray diffraction at conditions where no significant interference effects between crystalline film and substrate occur. Extending the x-ray diffraction analysis to conditions where interference effects between the crystalline film and the substrate appear, it is also possible to determine the morphology of the amorphous interface film. The analysis method presented in this work is useful for the current and future analyses of amorphous structures between crystalline structures in general and is therefore applicable to many different material systems. This incorporates crystalline thin and ultrathin films on crystalline substrates as well as crystalline multilayers on crystalline and also on amorphous substrates. We apply the method developed here to characterize both crystalline praseodymia films and amorphous interface layers, which could be detected neither by x-ray reflection nor by x-ray diffraction previously.
ISSN: 10980121
DOI: 10.1103/PhysRevB.79.245422

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