Real-Time Monitoring of Strain Accumulation and Relief during Epitaxy of Ultrathin Co Ferrite Films with Varied Co Content
| Autor(en): | Thien, Jannis Rodewald, Jari Pohlmann, Tobias Ruwisch, Kevin Bertram, Florian Küpper, Karsten Wollschläger, J. |
Stichwörter: | Materials science; X-ray photoelectron spectroscopy; Molecular beam epitaxy; Epitaxy; X-ray reflectivity; Ferrite (magnet); Diffraction; Thin film; Electron diffraction; Surface roughness; Surface finish; Analytical Chemistry (journal); Substrate (aquarium); Crystallography; Layer (electronics); Composite material; Optics; Chemical engineering; Nanotechnology; Chemistry; Physics; Oceanography; Chromatography; Geology; Engineering | Erscheinungsdatum: | 2023 | Band: | 16 | Ausgabe: | 23 | Startseite: | 7287 | Seitenende: | 7287 | DOI: | https://doi.org/10.3390/ma16237287 |
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