COMBINED DEPTH PROFILE ANALYSIS WITH SNMS, SIMS AND XPS - PREFERENTIAL SPUTTERING AND OXYGEN-TRANSPORT IN BINARY METAL-OXIDE MULTILAYER SYSTEMS

DC FieldValueLanguage
dc.contributor.authorALBERS, T
dc.contributor.authorNEUMANN, M
dc.contributor.authorLIPINSKY, D
dc.contributor.authorWIEDMANN, L
dc.contributor.authorBENNINGHOVEN, A
dc.date.accessioned2021-12-23T16:08:33Z-
dc.date.available2021-12-23T16:08:33Z-
dc.date.issued1994
dc.identifier.issn01422421
dc.identifier.urihttps://osnascholar.ub.uni-osnabrueck.de/handle/unios/8342-
dc.descriptionEuropean Conference on Applications of Surface and Interface Analysis (ECASIA 93), CATANIA, ITALY, OCT 04-08, 1993
dc.description.abstractDepth profile measurements of binary metal oxide multilayer systems have been performed by combined SIMS, SNMS and XPS. The combination of data about the particle fluxes and thus the bulk stoichiometry by SNMS, the ionic fluxes by SIMS, and the surface composition and the oxidation state of the metals by XPS provides a detailed insight into the mechanism of preferential sputtering in these systems. We present results on the systems Al2O3/TiO2 and SiO2/HfO2. The signal behaviour at the interfaces cannot be explained by preferential sputtering alone, but must include an oxygen transport mechanism due to chemical driving forces. By comparison of these systems with four other multilayer systems, we have developed a model of combined preferential sputtering and oxygen transport which accounts for the experimental results. The investigated systems can be classified according to their metal/oxygen sputter yield ratio, the degree of preferential sputtering, and the heat of formation of the oxide.
dc.language.isoen
dc.publisherJOHN WILEY & SONS LTD
dc.relation.ispartofSURFACE AND INTERFACE ANALYSIS
dc.subjectChemistry
dc.subjectChemistry, Physical
dc.subjectMODEL
dc.subjectSECONDARY ION
dc.titleCOMBINED DEPTH PROFILE ANALYSIS WITH SNMS, SIMS AND XPS - PREFERENTIAL SPUTTERING AND OXYGEN-TRANSPORT IN BINARY METAL-OXIDE MULTILAYER SYSTEMS
dc.typeconference paper
dc.identifier.doi10.1002/sia.740220105
dc.identifier.isiISI:A1994PG62100004
dc.description.volume22
dc.description.issue1-12
dc.description.startpage9
dc.description.endpage13
dc.publisher.placeTHE ATRIUM, SOUTHERN GATE, CHICHESTER PO19 8SQ, W SUSSEX, ENGLAND
dcterms.isPartOf.abbreviationSurf. Interface Anal.
Show simple item record

Page view(s)

2
Last Week
0
Last month
0
checked on Apr 20, 2024

Google ScholarTM

Check

Altmetric