CRATER FORMATION IN OXIDIC MATERIALS GENERATED BY USING ION AND LASER-BEAMS

DC FieldValueLanguage
dc.contributor.authorPRIGGEMEYER, S
dc.contributor.authorARPS, JH
dc.contributor.authorHEILAND, W
dc.date.accessioned2021-12-23T16:08:33Z-
dc.date.available2021-12-23T16:08:33Z-
dc.date.issued1993
dc.identifier.issn09370633
dc.identifier.urihttps://osnascholar.ub.uni-osnabrueck.de/handle/unios/8344-
dc.description7TH WORKING CONF ON APPLIED SURFACE ANALYSIS, JULICH, GERMANY, JUN 22-25, 1992
dc.description.abstractThe etch rate of material due to ion bombardment is the amount of material removed per unit time at a given set of beam parameters. Usually the etch rate is given in units of length/time. The length is measured as the depth of the craters formed by the ion/laser beam. With insulating materials a dependence was obtained of the etch rate on charging effects. Crater formation is also influenced by charging, i.e. `walls' are built around the craters. These effects were studied in different oxidic materials, (yttrium-iron-garnets (YIG) and gadolinium-gallium-garnets (GGG)).
dc.language.isoen
dc.publisherSPRINGER VERLAG
dc.relation.ispartofFRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY
dc.subjectChemistry
dc.subjectChemistry, Analytical
dc.subjectPB
dc.titleCRATER FORMATION IN OXIDIC MATERIALS GENERATED BY USING ION AND LASER-BEAMS
dc.typeconference paper
dc.identifier.doi10.1007/BF00321417
dc.identifier.isiISI:A1993LF24300046
dc.description.volume346
dc.description.issue1-3
dc.description.startpage214
dc.description.endpage217
dc.publisher.place175 FIFTH AVE, NEW YORK, NY 10010
dcterms.isPartOf.abbreviationFresenius J. Anal. Chem.
Show simple item record

Google ScholarTM

Check

Altmetric