Optical waveguide formation by MeV H+ implanted into LiNbO3 crystal

Autor(en): Hu, H
Lu, F
Chen, F
Wang, FX
Zhang, JH
Liu, XD
Wang, KM
Shi, BR
Stichwörter: ion implantation; optical waveguide; Optics; PROFILES; waveguide loss
Erscheinungsdatum: 2000
Herausgeber: ELSEVIER SCIENCE BV
Journal: OPTICS COMMUNICATIONS
Volumen: 177
Ausgabe: 1-6
Startseite: 189
Seitenende: 193
Zusammenfassung: 
A MeV H+ ion-implanted waveguide was formed on an LiNbO3 substrate. The dose of implanted H+ ions was 2 x 10(16) ions/cm(2) with an energy of 1.0 MeV at room temperature. The dark modes were measured using the prism coupling technique. The refractive index profile was analyzed using the reflectivity calculation method. The fiber probe technique was used to measure the attenuation of the waveguide. The lattice damage in the guide region caused by H+ ion implantation was investigated using the RBS/channeling technique. (C) 2000 Elsevier Science B.V. All rights reserved.
ISSN: 00304018
DOI: 10.1016/S0030-4018(00)00526-5

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