Improved epitaxy of ultrathin praseodymia films on chlorine passivated Si(111) reducing silicate interface formation

DC FieldValueLanguage
dc.contributor.authorGevers, S.
dc.contributor.authorFlege, J. I.
dc.contributor.authorKaemena, B.
dc.contributor.authorBruns, D.
dc.contributor.authorWeisemoeller, T.
dc.contributor.authorFalta, J.
dc.contributor.authorWollschlaeger, J.
dc.date.accessioned2021-12-23T16:10:07Z-
dc.date.available2021-12-23T16:10:07Z-
dc.date.issued2010
dc.identifier.issn00036951
dc.identifier.urihttps://osnascholar.ub.uni-osnabrueck.de/handle/unios/9164-
dc.description.abstractUltrathin praseodymia films have been deposited on both Cl-passivated and nonpassivated Si(111) substrates by molecular beam epitaxy. Comparative studies on the crystallinity and stoichiometry are performed by x-ray photoelectron spectroscopy, x-ray standing waves, and x-ray reflectometry. On nonpassivated Si(111) an amorphous silicate film is formed. In contrast, praseodymia deposited on Cl-passivated Si(111) form a well-ordered crystalline film with cubic-Pr(2)O(3) (bixbyite) structure. The vertical lattice constant of the praseodymia film is increased by 1.4% compared to the bulk value. Furthermore, the formation of an extended amorphous silicate interface layers is suppressed and confined to only one monolayer. (C) 2010 American Institute of Physics. [doi:10.1063/1.3525175]
dc.description.sponsorshipDeutsche Forschungsgemeinschaft (DFG) via Graduate CollegeGerman Research Foundation (DFG) [695]; The authors acknowledge the Deutsche Forschungsgemeinschaft (DFG) via Graduate College 695 for financial support. Furthermore, Dr. Dmitri Novikov and Dr. Christian Sternemann are acknowledged for beamline support. Synchrotron experiments were carried out at DESY and DELTA. DESY is a member of the Helmholtz Association (HGF).
dc.language.isoen
dc.publisherAMER INST PHYSICS
dc.relation.ispartofAPPLIED PHYSICS LETTERS
dc.subjectOXIDATION
dc.subjectPhysics
dc.subjectPhysics, Applied
dc.subjectPR2O3
dc.subjectSURFACE
dc.titleImproved epitaxy of ultrathin praseodymia films on chlorine passivated Si(111) reducing silicate interface formation
dc.typejournal article
dc.identifier.doi10.1063/1.3525175
dc.identifier.isiISI:000285481000053
dc.description.volume97
dc.description.issue24
dc.contributor.orcid0000-0002-8346-6863
dc.contributor.orcid0000-0002-4154-822X
dc.contributor.researcheridAAD-3164-2020
dc.contributor.researcheridJ-6354-2012
dc.contributor.researcheridF-4821-2016
dc.publisher.placeCIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA
dcterms.isPartOf.abbreviationAppl. Phys. Lett.
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