Browsing by Author Deiter, C.

Showing results 1 to 14 of 14
Issue DateTitleAuthor(s)
2009Effect of amorphous interface layers on crystalline thin-film x-ray diffractionWeisemoeller, T.; Bertram, F. ; Gevers, S.; Deiter, C.; Greuling, A.; Wollschlaeger, J.
2009Epitaxial growth of Bi(111) on Si(001)Jnawali, G.; Hattab, H.; Bobisch, C.A.; Bernhart, A.; Zubkov, E.; Deiter, C.; Weisemoeller, T.; Bertram, F. ; Wollschl̈ager, J. ; M̈oller, R.; Hoegen, M.H.-V.
2008Epitaxy of single crystalline PrO2 films on Si(111)Weisemoeller, T.; Deiter, C.; Bertram, F. ; Gevers, S.; Giussani, A.; Zaumseil, P.; Schroeder, T.; Wollschlaeger, J.
2009Erratum: Epitaxial growth of Bi(111) on Si(001) (e-Journal of Surface Science and Nanotechnology (2009) 7 (441-447))Jnawali, G.; Hattab, H.; Bobisch, C.A.; Bernhart, A.; Krenzer, B.; Zubkov, E.; Deiter, C.; Weisemoeller, T.; Bertram, F. ; Wollschläger, J. ; Möller, R.; Horn-Von Hoegen, M.
2006Homogeneous Si films on CaF2/Si(111) due to boron enhanced solid phase epitaxyWollschlaeger, J.; Deiter, C.; Bierkandt, M.; Gerdes, A.; Baeumer, M.; Wang, C. R.; Mueller, B. H.; Hofmann, K. R.
2011In-situ x-ray diffraction studies on post-deposition vacuum-annealing of ultra-thin iron oxide filmsBertram, F. ; Deiter, C.; Pflaum, K.; Suendorf, M.; Otte, C.; Wollschlaeger, J.
2009Postdeposition annealing induced transition from hexagonal Pr2O3 to cubic PrO2 films on Si(111)Weisemoeller, T.; Bertram, F. ; Gevers, S.; Greuling, A.; Deiter, C.; Tobergte, H.; Neumann, M.; Wollschlaeger, J.; Giussani, A.; Schroeder, T.
2013Reordering between tetrahedral and octahedral sites in ultrathin magnetite films grown on MgO(001)Bertram, F. ; Deiter, C.; Schemme, T. ; Jentsch, S.; Wollschlaeger, J.
2007Solid phase epitaxy of Ge films on CaF2/Si(111)Rugeramigabo, E. P.; Deiter, C.; Wollschlaeger, J.
2009Structural phase transition of ultra thin PrO2 films on Si(111)Gevers, S.; Weisemoeller, T.; Zimmermann, B.; Bertram, F. ; Deiter, C.; Wollschlaeger, J.
2010Structure and stability of cub-Pr2O3 films on Si(111) under post deposition annealing conditionsGevers, S.; Weisemoeller, T.; Zimmermann, B.; Deiter, C.; Wollschläger, J. 
2011Surfactant enhanced solid phase epitaxy of Ge/CaF2/Si(111): Synchrotron x-ray characterization of structure and morphologyWollschlaeger, J.; Deiter, C.; Wang, C. R.; Mueller, B. H.; Hofmann, K. R.
2008The influence of lattice oxygen on the initial growth behavior of heteroepitaxial Ge layers on single crystalline PrO2(111)/Si(111) support systemsGiussani, A.; Seifarth, O.; Rodenbach, P.; Muessig, H.-J.; Zaumseil, P.; Weisemoeller, T.; Deiter, C.; Wollschlaeger, J.; Storck, P.; Schroeder, T.
2012X-ray diffraction study on size effects in epitaxial magnetite thin films on MgO(001)Bertram, F. ; Deiter, C.; Hoefert, O.; Schemme, T. ; Timmer, F.; Suendorf, M.; Zimmermann, B.; Wollschlaeger, J.